US Patent Issued to TOPCON on June 16 for "Unevenness level inspecting device, unevenness level inspectiing system, and unevenness level inspecting method" (Japanese Inventor)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,656,114, issued on June 16, was assigned to TOPCON Corp. (Tokyo).

"Unevenness level inspecting device, unevenness level inspectiing system, and unevenness level inspecting method" was invented by Takeshi Kikuchi (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "An unevenness level inspecting device includes a target T at a known distance from a to-be-inspected surface, a traveling unit for traveling on the to-be-inspected surface, a first marker for marking information on the to-be-inspected surface, and a control unit configured to control the first marker, and the control unit calculates a height of the to-be-inspected surface at a measurement pos...