US Patent Issued to TOKYO OHKA KOGYO on Sept. 22 for "Cleaning liquid and method for cleaning substrate" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,742,138, issued on Sept. 22, was assigned to TOKYO OHKA KOGYO Co. LTD. (Kawasaki, Japan).

"Cleaning liquid and method for cleaning substrate" was invented by Yukihisa Wada (Kawasaki, Japan), Kohei Serizawa (Kawasaki, Japan), Choitsu Go (Kawasaki, Japan) and Kazumasa Wakiya (Kawasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A cleaning liquid for cleaning a substrate having a first metal atom-containing layer that contains ruthenium and a second metal atom-containing layer that contains a metal atom other than ruthenium, both of the layers contacting each other, and at least one of the first metal atom-containing layer and the second metal a...