US Patent Issued to Tokyo Ohka Kogyo on March 3 for "Resist composition and resist pattern forming method" (Japanese Inventors)

ALEXANDRIA, Va., March 3 -- United States Patent no. 12,566,376, issued on March 3, was assigned to Tokyo Ohka Kogyo Co. Ltd. (Kawasaki, Japan).

"Resist composition and resist pattern forming method" was invented by Makoto Sakata (Kawasaki, Japan), Masatoshi Arai (Kawasaki, Japan) and Takatoshi Inari (Kawasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A resist composition which generates an acid when the resist composition is exposed and whose solubility with respect to a developing liquid varies by action of the acid. The resist composition contains a base material component whose solubility with respect to a developing liquid is varied by action of an acid and an acid generator component that g...