US Patent Issued to TOKYO OHKA KOGYO on July 14 for "Chemical solution for removing precious metal, method for manufacturing chemical solution, method for treating substrate, method for manufacturing semiconductor device" (Japanese Inventor)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,172, issued on July 14, was assigned to TOKYO OHKA KOGYO Co. LTD. (Kanagawa, Japan).

"Chemical solution for removing precious metal, method for manufacturing chemical solution, method for treating substrate, method for manufacturing semiconductor device" was invented by Kazuhiro Takahashi (Kanagawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A chemical solution for removing a precious metal includes a cerium-containing oxidizing agent (A), an acid component (B) selected from the group consisting of carbonic acid, formic acid, propionic acid, butyric acid, and sulfonic acid, and salts thereof, and water."

The patent was filed on Dec. 4, 20...