US Patent Issued to Tokyo Electron on Sept. 8 for "Substrate processing system and substrate transfer method" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,437, issued on Sept. 8, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing system and substrate transfer method" was invented by Takehiro Shindo (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a substrate processing system comprising: a plurality of modules including a processing chamber in which a substrate is held and processing is performed on the substrate; a transfer chamber to which the plurality of modules are connected; a substrate transfer device provided inside the transfer chamber, for transferring the substrate to the plurality of modules and taking out the substrate from the plurality o...