US Patent Issued to Tokyo Electron on Sept. 8 for "Substrate processing system and maintenance method" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,432, issued on Sept. 8, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing system and maintenance method" was invented by Takashi Dokan (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing system comprises a substrate processing apparatus, a vacuum transport chamber, a transport mechanism, a suction mechanism and a controller. The substrate processing apparatus includes a vacuum processing chamber configured to perform processing of a substrate. The vacuum transport chamber is connected to the vacuum processing chamber and includes a transport port communicating with the vacuum processing chamber. The ...