US Patent Issued to Tokyo Electron on Sept. 8 for "Precoat method for substrate processing apparatus and substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,729,433, issued on Sept. 8, was assigned to Tokyo Electron Ltd. (Tokyo).

"Precoat method for substrate processing apparatus and substrate processing apparatus" was invented by Taichi Monden (Yamanashi, Japan) and Atsushi Tanaka (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A precoat method for a substrate processing apparatus for depositing on a substrate using a raw material gas and a reducing gas is provided. The method includes: a) supplying a fluorine-containing gas into a processing chamber to clean an inside of the processing chamber; b) after a), supplying a reducing gas into the processing chamber to purge the inside of the pr...