US Patent Issued to Tokyo Electron on Sept. 23 for "Substrate processing apparatus and parameter acquisition method" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,424,416, issued on Sept. 23, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing apparatus and parameter acquisition method" was invented by Kazuhito Yamada (Miyagi, Japan) and Hiroki Endo (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes a heater resistor; a digital filter configured to filter at least one of a detection voltage, which is a digital voltage value detected as a voltage applied to the heater resistor, or a detection current, which is detected as a voltage calculated from the heater resistor and a current flowing in the heater resistor and converted into a digital voltag...