US Patent Issued to Tokyo Electron on Sept. 22 for "Solution treatment apparatus and cleaning method" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,743,033, issued on Sept. 22, was assigned to Tokyo Electron Ltd. (Tokyo).

"Solution treatment apparatus and cleaning method" was invented by Kenta Shibasaki (Koshi City, Japan), Hiroichi Inada (Koshi City, Japan), Satoshi Shimmura (Koshi City, Japan), Koji Takayanagi (Koshi City, Japan), Kenji Yada (Koshi City, Japan), Shinichi Seki (Koshi City, Japan) and Akihiro Teramoto (Koshi City, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A cleaning method of cleaning a solution treatment apparatus for applying a coating solution onto a substrate, the solution treatment apparatus including a holder holding and rotating the substrate; a coating solution ...