US Patent Issued to Tokyo Electron on Sept. 22 for "Method of measuring positional deviation of substrate stage and substrate processing apparatus" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,745,595, issued on Sept. 22, was assigned to Tokyo Electron Ltd. (Tokyo).

"Method of measuring positional deviation of substrate stage and substrate processing apparatus" was invented by Kiyoshi Mori (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of measuring a positional deviation of a substrate stage in a substrate processing apparatus provided rotatably inside a processing container, includes: detecting an initial position of a substrate transferred by an arm that transfers the substrate; placing the substrate on the substrate stage; rotating the substrate by a predetermined rotational angle by rotating the substrate stage; deliverin...