US Patent Issued to Tokyo Electron on Sept. 15 for "Film forming apparatus and method for manufacturing part having film containing silicon" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,734,543, issued on Sept. 15, was assigned to Tokyo Electron Ltd. (Tokyo).

"Film forming apparatus and method for manufacturing part having film containing silicon" was invented by Takayuki Ishii (Miyagi, Japan), Kazuya Nagaseki (Miyagi, Japan) and Michishige Saito (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A film forming apparatus is disclosed. The apparatus comprises a chamber; an exhaust unit configured to reduce the pressure in the chamber to a predetermined vacuum level; a holder disposed in the chamber and configured to hold a film forming target member on which a film is to be formed; a supply unit configured to supply a film f...