US Patent Issued to Tokyo Electron on Sept. 1 for "Substrate processing system and particle removal method" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,725,769, issued on Sept. 1, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing system and particle removal method" was invented by Hiroshi Nagaike (Miyagi, Japan), Naoki Sato (Miyagi, Japan), Masato Obara (Miyagi, Japan) and Hideyuki Osada (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing system includes a vacuum transfer module, a substrate processing module, an atmospheric transfer module, a load-lock module, at least one substrate transfer robot disposed in the vacuum transfer module and the atmospheric transfer module, and having at least one end effector, and a controller configured to control a pa...