US Patent Issued to Tokyo Electron on Sept. 1 for "Substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,727,439, issued on Sept. 1, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing apparatus" was invented by Manabu Honma (Iwate, Japan), Junnosuke Taguchi (Iwate, Japan) and Yasushi Takeuchi (Iwate, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes a vacuum chamber, a rotary table in the vacuum chamber, a stage, and a support that supports at least either the rotary table or stage, the support having a thermal expansion coefficient greater than the rotary table or stage that is supported. The rotary table or stage includes a protruding portion protruding toward the support. The support includes ...