US Patent Issued to Tokyo Electron on Oct. 27 for "Plasma source and plasma processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,776,478, issued on Oct. 27, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma source and plasma processing apparatus" was invented by Eiki Kamata (Yamanashi, Japan), Kenta Kato (Yamanashi, Japan) and Taro Ikeda (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a plasma source comprising: a housing that defines a plasma generation space; a gas inlet port disposed in the housing to introduce a gas; a supply port disposed in the housing to supply active species of plasma produced from the gas in the plasma generation space; an ignition power supply port disposed in the housing to supply a radio-frequency (RF) power for ignitin...