US Patent Issued to Tokyo Electron on Nov. 3 for "Substrate processing method and substrate processing apparatus using infrared spectroscopy with P-polarized infrared light" (New York Inventor)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,787,719, issued on Nov. 3, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing method and substrate processing apparatus using infrared spectroscopy with P-polarized infrared light" was invented by Yuji Otsuki (Albany, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "In a first measuring process, P-polarized infrared light is emitted onto a substrate at a first incident angle at which an interference signal becomes smaller than a change by light absorption by the substrate, and light transmitted through or reflected from the substrate is measured. In a substrate processing process, substrate processing is performed on the substrate afte...