US Patent Issued to Tokyo Electron on Nov. 25 for "Plasma processing device, and plasma processing method" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,482,635, issued on Nov. 25, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing device, and plasma processing method" was invented by Munehito Kagaya (Yamanashi, Japan), Satoru Kawakami (Yamanashi, Japan), Tsuyoshi Moriya (Tokyo), Tatsuo Matsudo (Yamanashi, Japan), Jun Yamawaku (Yamanashi, Japan) and Hiroyuki Onoda (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A dividing plate has insulating properties, and divides the inside of a processing vessel into a reaction chamber in which a body to be processed is placed, and a plasma generating chamber for generating plasma. Further, the dividing plate is provided, on a surface thereof on t...