US Patent Issued to Tokyo Electron on May 19 for "Temperature control device, substrate processing apparatus, and liquid amount control method" (Japanese Inventor)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,453, issued on May 19, was assigned to Tokyo Electron Ltd. (Tokyo).

"Temperature control device, substrate processing apparatus, and liquid amount control method" was invented by Kei Kobayashi (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A temperature control device includes a main tank configured to store a heating medium, a first sub-tank at a position above a reference position in the main tank, a second sub-tank at a position below the reference position in the main tank, a first connector pipe connecting the first sub-tank and the main tank and including a first valve, a second connector pipe connecting the second sub-tank and t...