US Patent Issued to Tokyo Electron on May 19 for "Pressure adjusting valve and semiconductor manufacturing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,443, issued on May 19, was assigned to Tokyo Electron Ltd. (Tokyo).

"Pressure adjusting valve and semiconductor manufacturing apparatus" was invented by Eiichi Komori (Aichi, Japan) and Tsuneyuki Okabe (Aichi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A pressure adjusting valve includes a pipe, a valve body arranged inside the pipe, and a support shaft configured to rotatably support the valve body. The pressure adjusting valve is configured to adjust pressure by rotating the valve body. The valve body has, inside the valve body, a valve body side flow path through which a purge gas can flow, and has a plurality of outlets that communicate...