US Patent Issued to Tokyo Electron on May 19 for "Plasma processing device and plasma processing method" (Japanese Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,633,499, issued on May 19, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing device and plasma processing method" was invented by Tatsuo Matsudo (Yamanashi, Japan) and Jun Yamawaku (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a plasma processing device comprising: a chamber; an upper electrode; a showerhead provided below the upper electrode, which divides an internal space of the chamber into a first space between the upper electrode and the showerhead and a second space below the showerhead, and provides a plurality of introduction ports for introducing a gas into the second space and a plurality of o...