ALEXANDRIA, Va., May 19 -- United States Patent no. 12,633,503, issued on May 19, was assigned to Tokyo Electron Ltd. (Tokyo).
"Plasma processing apparatus" was invented by Ryo Sasaki (Miyagi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus includes: a stage including a substrate placing portion and a peripheral portion surrounding the substrate placing portion; a focus ring placed on the peripheral portion of the stage; a cover ring surrounding an outer periphery of the stage; a conductive ring placed on the cover ring; a radio-frequency power supply coupled to the stage; first and second power supply lines electrically connected to the focus ring and the conductive ring, ...