US Patent Issued to Tokyo Electron on May 12 for "Substrate transfer apparatus and substrate transfer method" (Japanese Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,628,611, issued on May 12, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate transfer apparatus and substrate transfer method" was invented by Akinori Shimamura (Yamanashi, Japan) and Hiroki Oka (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is a substrate transfer apparatus comprising: a circular tube having a tube axis extending in a lateral direction and having a transfer region for a substrate in the circular tube; a magnetic field generating portion having a magnetic field generating surface facing the transfer region and configured to generate a magnetic field on the magnetic field generating surface; and a transfer bo...