ALEXANDRIA, Va., March 31 -- United States Patent no. 12,592,362, issued on March 31, was assigned to Tokyo Electron Ltd. (Tokyo).
"Plasma processing apparatus" was invented by Takeshi Kobayashi (Iwate, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus includes a radio-frequency (RF) power supply; a pair of plasma electrodes, and a matcher disposed between the pair of plasma electrodes and the RF power supply. The matcher includes an RF feed line supplied with RF power from the RF power supply; a ground line; a first load line connected to one of the plasma electrodes; a second load line connected to the other of the plasma electrodes; an impedance matching circuit connected ...