ALEXANDRIA, Va., March 24 -- United States Patent no. 12,584,220, issued on March 24, was assigned to Tokyo Electron Ltd. (Tokyo).
"Showerhead and substrate processing apparatus" was invented by Takuya Kawaguchi (Yamanashi, Japan), Takanobu Hotta (Yamanashi, Japan), Kensaku Narushima (Yamanashi, Japan), Hideaki Yamasaki (Yamanashi, Japan), Takashi Kakegawa (Yamanashi, Japan), Toshio Takagi (Yamanashi, Japan) and Takaya Yamauchi (Yamanashi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A showerhead includes a shower plate and a base member including a gas flow path, the base member fixing the shower plate. The showerhead includes gas supply members disposed at a gas diffusion space, the gas diffusion s...