US Patent Issued to Tokyo Electron on March 17 for "Multiple patterning with selective mandrel formation" (American, Japanese Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,581,921, issued on March 17, was assigned to Tokyo Electron Ltd. (Tokyo).

"Multiple patterning with selective mandrel formation" was invented by Katie Lutker-Lee (Albany, N.Y.), Angelique Raley (Albany, N.Y.) and Masanobu Honda (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of forming a device includes forming a patterned resist layer over a substrate using an extreme ultraviolet (EUV) lithography process. The method includes forming a mandrel in a plasma processing chamber by selectively depositing a mandrel material over the patterned resist layer, the mandrel including the patterned resist layer and the mandrel material."

Th...