US Patent Issued to Tokyo Electron on March 17 for "Balanced resonator source for plasma processing" (American, Japanese Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,580,153, issued on March 17, was assigned to Tokyo Electron Ltd. (Tokyo).

"Balanced resonator source for plasma processing" was invented by Qiang Wang (Austin, Texas), Michael Hummel (Austin, Texas), Zhiying Chen (Austin, Texas), Peter Lowell George Ventzek (Austin, Texas), Shyam Sridhar (Austin, Texas) and Mitsunori Ohata (Taiwa-cho, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "According to an embodiment, a plasma processing system is proposed. The plasma processing system includes a plasma chamber; an RF source configured to generate a forward RF wave; an impedance matching circuit coupled to the RF source, the impedance matching circuit conf...