US Patent Issued to Tokyo Electron on June 9 for "Plasma processing apparatus, power supply system, control method, program, and storage medium" (Japanese Inventor)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,651,725, issued on June 9, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing apparatus, power supply system, control method, program, and storage medium" was invented by Yuto Kosaka (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In a plasma processing apparatus, electrical bias energy is provided from a bias power supply to a substrate support. Source radio-frequency power is provided from a radio-frequency power supply to a radio-frequency electrode. The radio-frequency power supply selects, from a plurality of frequency groups, an initial frequency group corresponding to a specified process. The radio-frequency power supply...