US Patent Issued to Tokyo Electron on June 30 for "Substrate analysis system, substrate analysis method, and recording medium" (Japanese Inventor)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,670,569, issued on June 30, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate analysis system, substrate analysis method, and recording medium" was invented by Masashi Enomoto (Koshi City, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An analyzing device 10 includes an imaging unit 11 configured to image a substrate surface; a defect range estimation unit 131 configured to estimate a defect range, which is a range in which a defect exists on the substrate surface, based on an imaging result of the imaging unit 11; a gray value acquisition unit 132 configured to acquire multiple gray values in the defect range when light is radiated to the s...