US Patent Issued to Tokyo Electron on June 23 for "Wafer cleaning method and system" (New York Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,666,899, issued on June 23, was assigned to Tokyo Electron Ltd. (Tokyo).

"Wafer cleaning method and system" was invented by James Grootegoed (Albany, N.Y.), Ronald Nasman (Albany, N.Y.) and Peter Delia (Albany, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A wafer processing method and system are provided. The wafer processing system includes an isopropyl alcohol (IPA) evaporation system, an IPA condensation system, and a process chamber. The IPA evaporation system evaporates liquid IPA into IPA vapor. The IPA condensation system condenses a portion of the IPA vapor into distilled high purity liquid IPA. The process chamber rinses a semiconductor ...