ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,350, issued on June 23, was assigned to Tokyo Electron Ltd. (Tokyo).

"Particle monitoring system, particle monitoring method, and monitoring device" was invented by Satoru Teruuchi (Kurokawa-gun, Japan), Jun Hirose (Kurokawa-gun, Japan), Kazuya Nagaseki (Kurokawa-gun, Japan) and Shinji Himori (Kurokawa-gun, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A particle monitoring system includes a light emitting device for irradiating an inside of a plasma processing apparatus with light, and a monitoring device to be placed on a stage in the plasma processing apparatus. The monitoring device includes a base substrate, a plurality of imaging device...