US Patent Issued to Tokyo Electron on June 23 for "Liquid processing apparatus and liquid processing method" (Japanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,661,694, issued on June 23, was assigned to Tokyo Electron Ltd. (Tokyo).

"Liquid processing apparatus and liquid processing method" was invented by Kazuki Kosai (Koshi, Japan), Taisei Inoue (Koshi, Japan), Yusuke Takamatsu (Koshi, Japan), Takahisa Otsuka (Koshi, Japan), Masaru Amai (Tokyo), Itaru Kanno (Tokyo) and Hiroshi Yano (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A liquid processing apparatus includes: a storage tank that stores a processing liquid; a first circulation line that causes the processing liquid sent from the storage tank to pass through a first filter and to return to the storage tank; and at least one second circulation li...