US Patent Issued to Tokyo Electron on June 23 for "Etching processing apparatus, etching processing system, analysis apparatus, etching processing method, and storage medium" (Japanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,665,176, issued on June 23, was assigned to Tokyo Electron Ltd. (Tokyo).

"Etching processing apparatus, etching processing system, analysis apparatus, etching processing method, and storage medium" was invented by Ryo Igosawa (Miyagi, Japan) and Hironari Sasagawa (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An etching processing apparatus includes a storage that stores a learned model of each group generated by each learning processing in a case where each processing condition acquired during execution of a specific step of an etching processing, is classified into a plurality of groups according to a difference in effects when executin...