US Patent Issued to Tokyo Electron on June 2 for "Substrate processing apparatus and substrate processing method" (Japanese Inventors)

ALEXANDRIA, Va., June 2 -- United States Patent no. 12,644,186, issued on June 2, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate processing apparatus and substrate processing method" was invented by Tatsuya Yamaguchi (Tokyo), Yutaka Sasaki (Iwate, Japan), Makoto Takahashi (Iwate, Japan), Toru Ishii (Iwate, Japan), Naoshige Fushimi (Yamanashi, Japan) and Koji Yoshii (Iwate, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes: a processing container that accommodates a substrate; a processing gas supply that supplies a processing gas into the processing container; an exhaust that exhausts an inside of the processing container; a heater that heats the processi...