US Patent Issued to Tokyo Electron on June 16 for "Method for controlling temperature of substrate support and inspection apparatus" (Japanese Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,660,047, issued on June 16, was assigned to Tokyo Electron Ltd. (Tokyo).

"Method for controlling temperature of substrate support and inspection apparatus" was invented by Shigeru Kasai (Yamanashi, Japan), Hiroyuki Nakayama (Yamanashi, Japan), Yutaka Akaike (Yamanashi, Japan), Hiroaki Komiya (Yamanashi, Japan) and Yoshiyasu Kato (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for adjusting a temperature of a substrate support is provided. In an apparatus for inspecting a target device, a substrate placement surface of the substrate support is divided into multiple regions and a heater is disposed in each of the multiple regions...