US Patent Issued to Tokyo Electron on July 7 for "Plasma processing apparatus and plasma control method" (Japanese Inventors)

ALEXANDRIA, Va., July 7 -- United States Patent no. 12,676,293, issued on July 7, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing apparatus and plasma control method" was invented by Kazushi Kaneko (Yamanashi, Japan), Satoru Kawakami (Yamanashi, Japan) and Yuki Osada (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is a plasma processing apparatus comprising: a processing chamber having a processing space; an electromagnetic wave generator configured to generate electromagnetic waves for plasma excitation; a dielectric having a first surface; an electromagnetic wave supply part configured to supply the electromagnetic waves to the processing space via the dielectric; and...