US Patent Issued to Tokyo Electron on July 7 for "Ignition control method, film formation method, and substrate processing apparatus" (Japanese Inventor)

ALEXANDRIA, Va., July 7 -- United States Patent no. 12,676,291, issued on July 7, was assigned to Tokyo Electron Ltd. (Tokyo).

"Ignition control method, film formation method, and substrate processing apparatus" was invented by Takeshi Kobayashi (Iwate, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An ignition control method includes: preparing a substrate processing apparatus including a processing container that accommodates a substrate, a plasma box formed in the processing container, an electrode disposed on the plasma box, a radio-frequency (RF) power supply connected to the electrode via a matching unit, and a switch disposed between the matcher and the electrode; setting the switch during a pro...