US Patent Issued to Tokyo Electron on July 28 for "Plasma processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,695,064, issued on July 28, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing apparatus" was invented by Yusuke Hayasaka (Miyagi, Japan), Shuhei Yamabe (Miyagi, Japan), Naoki Tamaru (Miyagi, Japan), Keisuke Yoshimura (Miyagi, Japan) and Kyo Tsuboi (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus is for performing plasma processing in a depressurizable inner space. The apparatus includes a chamber having therein an inner space, a supporting table provided in the inner space and configured to support a substrate to be mounted thereon, one or more first members included in the chamber or separate fro...