ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,537,167, issued on Jan. 27, was assigned to Tokyo Electron Ltd. (Tokyo).
"Plasma processing apparatus" was invented by Masaki Hirayama (Fuchu, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus includes a chamber, a substrate support, an excitation electrode, and a resonator. The resonator includes an inner side portion and an outer side portion extending coaxially, and conductive plates arranged parallel to each other in a vertical direction. The resonator provides a waveguide path extending between the inner and outer side portions and including a plurality of layers arranged alternately with the conductive plates. Each...