US Patent Issued to Tokyo Electron on Feb. 24 for "Plasma processing apparatus and temperature controlling method" (Japanese Inventor)

ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,562,354, issued on Feb. 24, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing apparatus and temperature controlling method" was invented by Kazuhito Yamada (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A base disposed in a plasma processing chamber. An electrostatic chuck disposed on an upper portion of the base, the electrostatic chuck including a first part and a second part. A first heater electrode layer group including at least one heater electrode layer disposed in the first part. A second heater electrode layer group including at least one heater electrode layer disposed in the second part. A power source is electric...