ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,553,128, issued on Feb. 17, was assigned to Tokyo Electron Ltd. (Tokyo).
"Particle suppression method" was invented by Kazuki Dempoh (Yamanashi, Japan), Daeho Kim (Hillsboro, Ore.), Atsushi Matsumoto (Yamanashi, Japan) and Hideaki Yamasaki (Yamanashi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A particle suppression method includes a) supplying a first processing gas containing a halogen element and a metal element into a chamber in which a substrate is accommodated and plasmatizing the first processing gas to form a film containing the metal element on the substrate, b) reducing a surface of a deposit formed on an inner wall of the chamber by...