US Patent Issued to Tokyo Electron on Feb. 10 for "Plasma processing apparatus, control method, and storage medium for suppressing deterioration effects from wear of an edge ring" (Japanese, American Inventors)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,548,744, issued on Feb. 10, was assigned to Tokyo Electron Ltd. (Tokyo).

"Plasma processing apparatus, control method, and storage medium for suppressing deterioration effects from wear of an edge ring" was invented by Soya Todo (Boise, Idaho), Ryohei Takeda (Miyagi, Japan), Muneyuki Omi (Miyagi, Japan), Shin Okamoto (Boise, Idaho) and Joji Takayoshi (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides a non-transitory computer-readable storage medium storing a control program of a plasma processing apparatus which performs a plasma processing by supplying a source power to a plasma generator and supplying a bias...