US Patent Issued to Tokyo Electron on Feb. 10 for "Patterning with self-assembled monolayer" (New York, California Inventors)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,550,696, issued on Feb. 10, was assigned to Tokyo Electron Ltd. (Tokyo).

"Patterning with self-assembled monolayer" was invented by Dina H. Triyoso (Albany, N.Y.), Robert D. Clark (Fremont, Calif.) and Hirokazu Aizawa (Albany, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of processing a substrate that includes: selectively depositing a self-assembled monolayer (SAM) on a metal line of the substrate, the SAM being in contact with the metal line, a surface of the substrate further including a first dielectric material that surrounds the metal line; selectively depositing a second dielectric material over the first dielectric material; form...