US Patent Issued to Tokyo Electron on Feb. 10 for "Fluid control device and substrate processing apparatus" (Japanese Inventor)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,550,657, issued on Feb. 10, was assigned to Tokyo Electron Ltd. (Tokyo).

"Fluid control device and substrate processing apparatus" was invented by Takashi Yoshida (Oshu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A fluid control device that controls a fluid supplied into a process container includes: a flow path block; and a fluid controller installed to the flow path block. The flow path block includes: a gas supply flow path including an inlet, through which the fluid is introduced, and an outlet through which the fluid flows into the process container; and a storage chamber that stores the fluid in the gas supply flow path between the inlet...