ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,509,770, issued on Dec. 30, was assigned to Tokyo Electron Ltd. (Tokyo).
"Film forming method and film forming apparatus" was invented by Toshio Hasegawa (Nirasaki, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A film forming method for forming a metal carbide film on a substrate, includes: forming a metal carbide film including a first metal element and a second metal element different from the first metal element on the substrate by performing, multiple times in a time-sharing manner: supplying a first precursor gas including the first metal element and not including carbon to the substrate; supplying a second precursor gas including the second...