US Patent Issued to Tokyo Electron on Dec. 2 for "Apparatus for processing substrate, gas shower head, and method for processing substrate" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,486,575, issued on Dec. 2, was assigned to Tokyo Electron Ltd. (Tokyo).

"Apparatus for processing substrate, gas shower head, and method for processing substrate" was invented by Hirokazu Ueda (Osaka, Japan), Naoki Umeshita (Tokyo), Toshikazu Akimoto (Tokyo) and Hiroki Maehara (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus for processing a substrate by supplying a processing gas to the substrate in a processing container. The apparatus comprises: a mounting table provided in the processing container and for mounting the substrate; a gas shower head comprising a gas diffusion space provided at a position facing the mounting ...