US Patent Issued to Tokyo Electron on Aug. 25 for "Profile simulation calibration with in-situ sensor data" (California, Texas Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,719,035, issued on Aug. 25, was assigned to Tokyo Electron Ltd. (Tokyo).

"Profile simulation calibration with in-situ sensor data" was invented by Jun Shinagawa (Fremont, Calif.), Inga Kuznetsova (Fremont, Calif.), Shyam Sridhar (Austin, Texas) and Peter Lowell George Ventzek (Austin, Texas).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of profile simulator calibration is provided. The method includes executing a plasma recipe on a wafer in a processing chamber. In-situ plasma sensor data are collected by in-situ plasma sensors while the plasma recipe is executed. Estimated plasma parameters are obtained based on the in-situ plasma sensor data....