US Patent Issued to Tokyo Electron on Aug. 25 for "Flow stability control in drying liquid between plates" (Texas Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,716,654, issued on Aug. 25, was assigned to Tokyo Electron Ltd. (Tokyo).

"Flow stability control in drying liquid between plates" was invented by Derek Bassett (Austin, Texas) and Rencheng Dong (Austin, Texas).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of flow control is provided. The method includes injecting a liquid onto a wafer via a dispense system. The dispense system includes a plate and an injection hole in the plate. The plate is positioned away from the wafer at a distance and has a diameter equal to or larger than the wafer. A drying gas is injected onto the wafer via the dispense system to push out the liquid. While injecting the...