US Patent Issued to Tokyo Electron on Aug. 25 for "Deposition methods using pulsed plasma with varying pulse frequency" (American, Japanese Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,716,131, issued on Aug. 25, was assigned to Tokyo Electron Ltd. (Tokyo).

"Deposition methods using pulsed plasma with varying pulse frequency" was invented by Evrim Solmaz (Austin, Texas), Melvin Verbaas (Austin, Texas), Jianping Zhao (Austin, Texas), Barton Lane (Austin, Texas), Du Zhang (Albany, N.Y.) and Toru Hisamatsu (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for a cyclic deposition process includes loading a substrate into a plasma processing chamber; generating source power pulses having a pulse frequency that varies from a first frequency to a different second frequency; and performing the cyclic deposition process to...