US Patent Issued to Tokyo Electron on Aug. 18 for "Temperature control method and substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,709,805, issued on Aug. 18, was assigned to Tokyo Electron Ltd. (Tokyo).

"Temperature control method and substrate processing apparatus" was invented by Hisashi Inoue (Tokyo), Tatsuya Yamaguchi (Yamanashi, Japan), Noriaki Koyama (Tokyo), Yuichi Takenaga (Yamanashi, Japan) and Tatsuya Watanabe (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A temperature control method includes providing a substrate processing apparatus including a processing container, and a heater that heats the processing container; setting an amount of temperature change with respect to a target temperature having a value up to a second digit smaller than a first dig...