US Patent Issued to Tokyo Electron on Aug. 18 for "Inorganic/hybrid stress films" (New York Inventors)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,713,848, issued on Aug. 18, was assigned to Tokyo Electron Ltd. (Tokyo).

"Inorganic/hybrid stress films" was invented by Charlotte Cutler (Albany, N.Y.), Michael Murphy (Albany, N.Y.) and David Conklin (Saratoga Springs, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of processing a substrate that includes: loading a substrate into a deposition tool, the substrate including a major working surface and a backside surface opposite the major working surface, the major working surface including a semiconductor device structure; in the deposition tool, performing a solution-based process to form a film on the backside surface, the film being an...