US Patent Issued to Tokyo Electron on Aug. 11 for "Substrate support and substrate processing apparatus" (Japanese Inventor)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,706,282, issued on Aug. 11, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate support and substrate processing apparatus" was invented by Chishio Koshimizu (Miyagi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A structure efficiently provides bias power to an object placed on a substrate support. A substrate support includes a dielectric portion and at least one electrode. The at least one electrode is located in the dielectric portion to provide bias power to an object placed on the dielectric portion."

The patent was filed on Sept. 9, 2020, under Application No. 17/015,100.

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